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Persistent electrical doping of Bi2Sr2CaCu2O8+x mesa structures

机译:Bi2sr2CaCu2O8 + x台面结构的持续电掺杂

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摘要

Application of a significantly large bias voltage to small Bi2Sr2CaCu2O8+xmesa structures leads to persistent doping of the mesas. Here we employ thiseffect for analysis of the doping dependence of the electronic spectra ofBi-2212 single crystals by means of intrinsic tunneling spectroscopy. We areable to controllably and reversibly change the doping state of the same singlecrystal from underdoped to overdoped state, without changing its chemicalcomposition. It is observed that such physical doping is affectingsuperconductivity in Bi-2212 similar to chemical doping by oxygen impurities:with overdoping the critical temperature and the superconducting gap decrease,with underdoping the c-axis critical current rapidly decreases due toprogressively more incoherent interlayer tunneling and the pseudogap rapidlyincreases, indicative for the presence of the critical doping point. Wedistinguish two main mechanisms of persistent electric doping: (i) even involtage contribution, attributed to a charge transfer effect, and (ii) odd involtage contribution, attributed to reordering of oxygen impurities.
机译:在小的Bi2Sr2CaCu2O8 + xmesa结构上施加很大的偏置电压会导致台面的持久掺杂。在这里,我们利用本效应通过本征隧穿光谱法分析Bi-2212单晶电子光谱的掺杂依赖性。我们可以控制且可逆地将同一单晶的掺杂状态从未掺杂状态改变为过量掺杂状态,而无需更改其化学成分。可以看出,这种物理掺杂对Bi-2212中的超导电性有影响,类似于通过氧杂质进行化学掺杂:随着掺杂温度的增加和超导间隙的减小,超掺杂的c轴临界电流由于不相干的层间隧穿和不连续的进行而迅速减小。伪间隙迅速增加,表明存在临界掺杂点。区分持久电掺杂的两个主要机制:(i)归因于电荷转移效应的均匀电压贡献,和(ii)归因于氧杂质的重新排序的奇数电压贡献。

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